Notebook ref: JANB03-030-34
Protocol taken from Rat’s cleavable tri-block tests (Schilke, JCIS 2011). Rat’s notebook reference: AVINBI-131
Overview:
The protocol involves “piranha” wash (standard method), ethanol rinse, 5% ODTMS in ethanol warmed, react warm at 45 dgrees C, react at RT for 4 h, rinse ODTMS with ethanol.
Detailed protocol:
- Clean surface using piranha wash (JANB02-09) or choromosulfuric acid wash… depending on surface.
- Prepare acidified ethanol by diluting acetic acid in ethanol to pH 5.0. Approximately 10:1 ethanol to acetic acid.
- Warm the acidified ethanol to scintillation vial. Warm to 45 degrees C (place in oven).
- Pre-react silane: Add ODTMS to vial and let react for 5 min before covering wafers. React at 45 degrees C.
- After all wafers are washed rinse with acidified ethanol. Leave in Petri dish. Blow dry immediately before adding silane. Do this while the silane is pre-reacting.
- Cover wafers with silane. Let react for 4 h. Place on horizontal rotator, approximately 60 rpm.
- After reaction, rinse surfaces with 95% ethanol by flooding.
- Transfer to dish with ethanol to remove residual ODTMS.
- Cure at 150 degrees C for 30 min.
Note: This procedure may be subject to minor changes. Volumes are not reported here because volumes will change depending on the number of samples. Refer to JANB03-034 for volumes used for 1 OWLS sensor. Refere to JANB03-30-33 for volumes used for 3 silica wafers (DO NOT scale up linearly… maybe).
