Curriculum Vitae

Konner E. K. Holden
PhD Student, Graduate Research Assistant
School of Electrical Engineering and Computer Science (EECS), Oregon State University
Corvallis, OR 97331
holdenk@oregonstate.edu

Current Research:

  • Process development for the atomic layer deposition (ALD) of ultra-thin insulators for infrared energy harvesting rectennas (In collaboration with RedWave Energy, Inc.).
  • Characterization of MIM diodes with intentionally placed transition metal defects using ALD for enhancing defect-enhanced tunneling.
  • Energy-enhanced ALD (In separate collaboration with Lam Research Corp. and MKS Instruments).
  • Studying the electrical properties of transparent conducting ALD NiO for thin film device applications.

Education:

  • PhD*: (3.73/4.00) Electrical Engineering, Oregon State University, Corvallis, OR. *2021
    • Working thesis topic: Novel application and development of ALD processes for thin film microelectronics
  • BSc: (3.43/4.00) Electrical Engineering, Oregon State University, Corvallis, OR 2017

Professional Experience:

  • 9/17 – Present
    Graduate Research Assistant, Senior Design Project Manager
    School of EECS, Oregon State University, Corvallis OR
  • 06/19 – 08/19
    Summer 2019 R&D Reliability Intern
    Technology Enablement, ON Semiconductor, Gresham OR
  • 12/17 – 6/17
    Novel Thin Film Materials and Devices Research Fellow
    School of EECS, Oregon State University, Corvallis OR
  • 4/16 – 9/17
    Undergraduate Research Assistant
    School of EECS, Oregon State University, Corvallis OR
  • 9/15 – 4/16
    Teaching Assistant
    School of EECS, Oregon State University, Corvallis OR

Peer-Reviewed Publications:

  1. (Accepted, pending publication) M. A. Jenkins, D. Z. Austin, K. E. K. Holden, D. Allman, J. F. Conley, Jr., “Laminate Al2O3/Ta2O5 Metal/Insulator/Insulator/Metal (MIIM) Devices for High Voltage Applications,” IEEE Trans. Electron Devices, Oct. 2019.
  2. K. E. K. Holden, C. L. Dezelah, and J. F. Conley, “Atomic Layer Deposition of Transparent p-Type Semiconducting Nickel Oxide Using Ni(tBu2DAD)2 and Ozone,” ACS Appl. Mater. Interfaces, vol. 11, no. 33, pp. 30437–30445, Aug. 2019.
  3. K. E. K. Holden and J. F. Conley, Jr., “Characterization of Atomic Layer Deposited Semiconducting Co3O4,” J. Vac. Sci. Technol. A, vol. 37, no. 2, p. 020903, Jan. 2019. Selected as JVST A Editor’s Pick.
  4. K. E. K. Holden, M. A. Jenkins, and J. F. Conley, Jr., “Characterization of Atomic Layer Deposited Cobalt Oxide,” ECS Trans., vol. 85, no. 13, pp. 735–741, Jun. 2018.
  5. D. Z. Austin, K. E. K. Holden, J. Hinz, and J. F. Conley, Jr., “Electrode modulated capacitance-electric field nonlinearity in metal-insulator-metal capacitors,” Appl. Phys. Lett., vol. 110, no. 26, p. 263503, Jun. 2017. Selected as APL Editor’s Pick.

Other Peer-Reviewed Publications:

The following publications and presentations appeared in proceedings that were distributed primarily to attendees (as CDs, printed volumes, availability through a public website, etc.).

  1. K. E. K. Holden, “The ALD of Oxides: Yes… there is still more science to be done!” presented during a special James Harper Award finalist session at the American Vacuum Society’s 66th Symposium and Exhibition, Columbus, OH. Oct. 2019.
  2. K. E. K. Holden, Y. Qi, J. F. Conley, Jr., “Precision Defect Engineering of MIM Diodes using Localized ALD Transition Metal Impurities in Al2O3 Tunnel Barriers” presented at the American Vacuum Society’s 65th Symposium and Exhibition, Columbus, OH. Oct. 2019.
  3. K. E. K. Holden, C. L. Dezelah, J. F. Conley, Jr., “Investigating Atomic Layer Deposition of Nickel Oxide using Ni(tBu2DAD)2 and Ozone” presented at the American Vacuum Society 19th International Conference on Atomic Layer Deposition, Bellevue WA. July 2019.
  4. K. E. K. Holden, C. L. Dezelah, J. F. Conley, Jr., “Investigating Atomic Layer Deposition of Nickel Oxide using Ni(tBu2DAD)2 and Ozone” presented at the American Vacuum Society’s 65th Symposium and Exhibition, Long Beach CA. October 2018.
  5. K. E. K. Holden, M. A. Jenkins, and J. F. Conley, Jr. “Characterization of Low-Temperature Atomic Layer Deposited Cobalt Oxide” presented at the 233rd Meeting of the Electrochemical Society, Seattle WA. May 2018.
  6. D. Z. Austin, M. A. Jenkins, K. E. K. Holden, and J. F. Conley, Jr., “High-Voltage Nanolaminate Metal-Insulator-Insulator-Metal (MIIM) Tunnel Diodes using ALD Al2O3 and Ta2O5” awarded 2nd place undergraduate poster at the 2017 Symposium of the American Vacuum Society’s Pacific Northwest Chapter, Corvallis OR. Sept. 2017.
  7. D. Z. Austin, M. A. Jenkins, K. E. K. Holden, and J. F. Conley, Jr., “High-Voltage Nanolaminate Metal-Insulator-Insulator-Metal (MIIM) Tunnel Diodes using ALD Al2O3 and Ta2O5” presented at the American Vacuum Society’d 17th International Conference on Atomic Layer Deposition, Denver CO. July 2017.

Honors and Awards:

  1. Thin Film Division Graduate Student Award and James Harper Award Finalist, 07/19, American Vacuum Society (AVS), Columbus, OH
  2. 2nd place Undergraduate Poster Competition, 09/17, PNW AVS Symposium, Corvallis, OR
  3. Novel Thin Film Materials and Devices Research Fellowship, 09/17–06/18, Oregon State University
  4. Honor Roll, 2015–2017, Oregon State University
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